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M-X Ray of Ta Excited by Highly Charged Ar and Xe Ions

M-X Ray of Ta Excited by Highly Charged Ar and Xe Ions
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摘要 The X-ray spectra induced by the highly charged xenon and argon ions impinging on a tantalum surface are reported. The experiment was done at the ECR ion source of H1RFL. It is found that the yield of the tantalum M-X rays increases intensively as the projectile kinetic energy increasing. Moreover, the tantalum M-X ray induced by the xenon ions is higher in energy and broader in width than that induced by the argon ions (as shown in Figs. 1 and 2). The X-ray spectra induced by the highly charged xenon and argon ions impinging on a tantalum surface are reported. The experiment was done at the ECR ion source of H1RFL. It is found that the yield of the tantalum M-X rays increases intensively as the projectile kinetic energy increasing. Moreover, the tantalum M-X ray induced by the xenon ions is higher in energy and broader in width than that induced by the argon ions (as shown in Figs. 1 and 2).
出处 《近代物理研究所和兰州重离子加速器实验室年报:英文版》 2005年第1期118-119,共2页 IMP & HIRFL Annual Report
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