摘要
用内外靶配置的多弧-磁控溅射技术在单晶硅和硬质合金上制备Ti-Si-N纳米复合涂层,研究衬底偏压和Si靶溅射电流对涂层结构和力学性能的影响,经过实验参数优化,在偏压为-150 V、Si靶电流为15 A的沉积条件下,得到Si的原子分数为6.3%的Ti-Si-N纳米复合涂层。X射线衍射、X射线光电子能谱和透射电镜分析表明,涂层中含有晶态TiN和非晶Si3N4,纳米尺寸的TiN颗粒镶嵌在非晶Si3N4基体结构中。纳米硬度计测试表明涂层的显微硬度为40 GPa,摩擦学实验表明其摩擦因数为0.89,可满足Ti-Si-N纳米复合涂层的工业化应用要求。
Ti-Si-N nanocomposite coatings were prepared on Si and cemented carbide substrates by using an industrial scale cathodic arc assisted medium-frequency magnetron sputtering system.The microstructure and properties of the coatings are predominately controlled by the bias voltage on the substrate and sputtering current of the Si magnetron target.X-ray diffraction,transmission electron microscopy,X-ray photoelectron spectroscopy and nanoindentation were employed to investigate the microstructure and mechanical properties of the coatings.The coatings were found to be nc-TiN/a-Si3N4 structure with the TiN crystalline grain sizes ranging from of 8-10 nm,exhibited a high microhardness of 40 GPa and a friction coefficient of 0.89 at the bias voltage of-150 V and sputtering current 15 A of the Si cathode source.The mechanical properties shows that the Ti-Si-N nanocomposite coatings satisfy the requirement for industrial applications.
出处
《粉末冶金材料科学与工程》
EI
2010年第6期543-548,共6页
Materials Science and Engineering of Powder Metallurgy
基金
国家科技重大专项(2009ZX04012-032)
国家自然科学基金资助项目(50905130)
