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电阻阵红外景象投影仪非均匀性校正方法学 被引量:2

Methodology of Nonuniformity Correction for Ressistor Array IR Sence Projector
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摘要 电阻阵红外景象投影仪是红外成像制导系统和前视红外系统等红外探测系统性能测试、评估和系统动态仿真的重要装置。但是其严重的辐射非均匀性限制了它的应用范围。因此,必须要进行校正。本文对非均匀性校正的方法学进行研究,综述几种有效的校正方法及其实施过程。 Ressistor array IR sence projector is the key device for measurement,evaluation and simulation of IR imaging guidance system and front looking IR system(FLIRS).However,its serious emissive nonuniformity limits the range of its application,so the emissive nonuniformity must be corrected.This paper describes the methodology of nonuniformity correction for ressisor array IR sence projector,and reviews some efficient correction ways,also analyses the advantages and disadvantages on these correction ways.
出处 《航空兵器》 2010年第6期63-66,共4页 Aero Weaponry
基金 航空科学基金项目(20080112005)
关键词 红外景象投影仪 非均匀性校正 方法学 IR sence projector nonuniformity correction methodology
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参考文献5

  • 1吴永刚,崔彬,吴根水,吕俊杰.基于MOS—电阻阵列的红外动态图像生成系统[J].测控技术,1996,15(5):55-57. 被引量:10
  • 2吴永刚.红外动态目标热图像物理生成装置[J].航空兵器,2001(1):8-10. 被引量:4
  • 3Olson E M,Murrer R L.Non-uniformity Correction of a Resistor Array Infrared Scene Projector[C] //Proceeding of SPIE,1999,3697:403-413.
  • 4Stanek C,Ewing L,Moore D.Conrideration and Algorithm Development for Scene-Based Nonuniformity Correction in Dynamic Infrared Projectors[C] //Proceeding of SPIE,1999,3697;379-390.
  • 5Joyce R A,Swierkowski L,Williams 0 M.Emissive Infrared Projector Sparse Grid Nonuniformity Correction[C] //Proceeding of SPIE,2005,5785:91-102.

二级参考文献2

共引文献11

同被引文献18

  • 1肖云鹏,马斌,梁平治.国产电阻阵列动态红外景像投射器研制进展[J].红外技术,2006,28(5):266-270. 被引量:22
  • 2Lcszek Swierkowski, Williams O M. Advanced flood nonuniformity corroction for emitter array infrared projectors[C]//SPIE, 2002, 4717: 108-119.
  • 3Leszck Swierkowski, Robert A J, Williams O M. Rsistor array infrared projector nonuniformity correction: search for performance improvement IV[C]//SPIE, 2009, 7301: 73010M.
  • 4苏德伦,廖守亿,张金生,等.电阻阵列非均匀性校正[J].红外与激光工程,2009,38(增刊):311-315.
  • 5Robert A Joyce, Leszek ^wierkowski, Owen M Williams.Resistor array infrared projector nonuniformity correction:search for performance improvement [C]// Proc. SPIEVol. 6208, 62081A(2006). USA: SPIE, 2006.
  • 6^wierkowski L, Joyce R A, Williams O M. Resistor arrayinfrared projector nonuniformity correction: search forperformance improvement II [C]// Proc. SPIE Vol. 6544,654403 (2007). USA: SPIE, 2007.
  • 7Joyce R A, Swierkowski L, Williams O M. Resistor arrayinfrared projector nonuniformity correction: search forperformance improvement III [C]// Proc. SPIE Vol. 6942,69420N (2008). USA: SPIE, 2008.
  • 8Leszek Swierkowski, Robert A Joyce, Owen M Williams.Resistor array infrared projector nonuniformity correction:search for performance improvement IV [C]// Proc. SPIEVol. 7301,73010M (2009). USA: SPIE, 2009.
  • 9R A Joyce, L Swierkowski, O M Williams. Emissiveinfrared projector sparse grid nonuniformity correction[C]// SPIE Vol. 5785, 91-102 (2005). USA: SPIE, 2005.
  • 10朱岩,王仕成,苏德伦,张金生,廖守亿.MOS电阻阵列非均匀性校正技术研究[J].红外技术,2009,31(3):148-151. 被引量:6

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