摘要
以十六烷基三甲基溴化铵(CTAB)为模板剂,正硅酸乙酯为硅源,在弱酸性条件下利用溶剂挥发诱导自组装(EISA)合成出具有介孔结构的二氧化硅薄膜.通过控制EISA过程中溶剂挥发的环境,可在1.4～3.1nm的范围内调节介孔结构的孔径.实验表明,较快的溶剂挥发速率有助于较大孔径的介孔结构生成.用该方法合成的介孔薄膜具有蠕虫状孔道结构和良好的孔径均一性.在外观上,该薄膜具有均匀、透明和无缺陷等特点,可以自支撑,并且具有一定的韧性.
Mesoporous silica films with pore diameters of 1.7—3.1 nm were synthesized through evaporation induced self-assembly using CTAB as surfactant and TEOS as Si source in weak acid media.The films were flexible,self-supporting and centimeter-sized with wormhole-like channel systems.By controlling the solvent remove process,the pore size of films could be tailored without negative influence on the pore size uniformity.A fast volatilization speed would lead to a large pore size,while a slow volatilization speed would result in a small pore size.
出处
《高等学校化学学报》
SCIE
EI
CAS
CSCD
北大核心
2010年第11期2136-2140,共5页
Chemical Journal of Chinese Universities
基金
国家"八六三"计划项目(批准号:041403311)资助
关键词
介孔薄膜
溶剂挥发诱导自组装
孔径调节
Mesoporous film
Solvent evaporation induced self-assembly
Pore size tailoring
