摘要
对依据半导体材料表面光催化反应基本原理建立的灵敏分析方法分别从方法原理、仪器装置以及应用等方面进行了评述，报道了近年来这一领域的研究进展。
A review is presented on the principle, experimental setup and its application of sensitive analytical methods based on the photocatalytic reaction on the surface of semiconductor materials. The researching progress in this field is described.
出处
《分析科学学报》
CAS
CSCD
1999年第2期169-174,共6页
Journal of Analytical Science
