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Effect of fabrication parameters on the microstructure,in-plane anisotropy and magnetostriction of Fe-Ga thin films 被引量:4

Effect of fabrication parameters on the microstructure,in-plane anisotropy and magnetostriction of Fe-Ga thin films
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摘要 The microstructure,in-plane anisotropy,and magnetic properties of Fe-Ga thin films were investigated by X-ray diffraction analysis,vibrating sample magnetometer,and capacitive cantilever method.The in-plane induced anisotropy is well formed by the applied magnetic field during sputtering,and the anisotropy field Hk decreases with the sputtering power increasing.The coercivity of Fe-Ga thin films decreases with increasing power when the sputtering power is less than 60 W and increases when the power is larger than 60 W.The magnetostriction of the thin films reaches 66 × 10-6 at the sputtering power of 60 W.Excellent Fe-Ga films,which exhibit good field sensitivity,low coercivity and high magnetostriction,have been fabricated at the power of 60 W,and they can be used as the materials of magnetostrictive transducers.
出处 《Rare Metals》 SCIE EI CAS CSCD 2010年第6期583-588,共6页 稀有金属(英文版)
基金 supported by the National Natural Science Foundation of China (Nos.50571034 and 50971056) and the State Key Laboratory of Powder Metallurgy,Central South University
关键词 metallic thin films MAGNETOSTRICTION magnetron sputtering ANISOTROPY metallic thin films magnetostriction magnetron sputtering anisotropy
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