摘要
介绍了一种低气压、高密度等离子体源———螺旋波激发等离子体源（ＨＷＰ），讲述了它的结构位形、天线耦合原理和参数设计原则，该离子源在实际中的应用以及目前研究状况．
A low pressure, high electron density plasma source——helicon-wave excited plasma source is described. Its configuration, antenna coupling and parameter design are outlined as well as a perspective of its application in etching and deposition and certain unsolved problems.
出处
《物理》
CAS
1999年第3期162-167,共6页
Physics
