摘要
采用原子力显微镜(AFM)、椭圆偏振光谱仪、Dage-Pc2400推理分析等测试方法研究了石英坩埚真空镀膜工艺获得的碳膜的表面状态、粗糙度,碳膜和石英坩埚的结合力,确定了用于CdZnTe晶体生长的石英坩埚真空镀碳的最优工艺参数。研究表明,以乙醇为碳源,坩埚真空退火9 h后,碳源通入量为1.5 mL时,获得了厚度为0.7163μm,表面粗糙度为4.7 nm,结合力达8.11 kg的碳膜。采用此工艺镀膜的石英坩埚生长CdZnTe晶体后,碳膜附着完好,晶体表面平整光洁,位错密度降低。
The carbon films coated on the inner surface of quartz ampoules in different technological conditions were tested and analyzed by atomic force microscopy（AFM）,Infrared Spectroscopic Ellipsometry and thrust analytic instrument.The effects of the technology parameters on the surface topography of carbon films and the thrusting force between carbon films and inner surface of quartz ampoules were studied.And the optimum technical parameters of vacuum carbon coating were obtained.When annealing time of 9 h and the gas volume of 1.5 mL,the thickness of carbon films is 0.7163 μm and its thrusting with quartz ampoule is 8.11 kg.Finally,transparency CdZnTe crystal were grown,which had smoother surface and lower dislocation density.
出处
《人工晶体学报》
EI
CAS
CSCD
北大核心
2010年第5期1114-1118,共5页
Journal of Synthetic Crystals
基金
国家自然科学基金(No.10675080
No.50902091)
上海大学研究生创新基金
上海高校优秀青年教师科研专项基金
关键词
CDZNTE晶体
真空镀碳
粗糙度
结合力
位错密度
CdZnTe crystal
vacuum carbon coating
roughness
thrusting force
dislocation density
