摘要
利用射频磁控溅射技术在（100）Si和玻璃衬底上沉积系列Mg掺杂ZnO（x=0~0.20）薄膜,XRD分析结果表明,Zn1-xMgxO薄膜均为六角纤锌矿结构,薄膜呈现出c轴择优生长特性,但随着x值的增加,晶格常数c逐渐减小。当x=0.20时,薄膜出现（100）面衍射峰,薄膜的c轴择优生长特性减弱。SEM分析表明,x=0.10时,薄膜表面平坦光滑,晶粒大小均匀,结构更加致密,结晶质量最佳。紫外可见光透射光谱表明,Mg的掺入提高薄膜在可见光范围内的透过率;同时增大了薄膜的禁带宽度;室温PL谱分析显示所有薄膜均出现了紫外发射峰和蓝光发射带,且紫外发射峰和蓝光发光带都随x值的增加而蓝移。
Zn1-xMgxO（x=0～0.2） thin films were deposited on（100）Si and glass substrates by RF magnetron sputtering.The XRD results indicated that all of those thin films are of the hexagonal wurtzite structure with crystallites showing a typical preferential growth along c-axis while the lattice constant c decreases gradually with the increasing value of x.When x=0.20,the（100） diffraction pattern arrives at its peak,which means the weakening of the typical preferential growth.The analysis of SEM images showed that when x=0.10,the film surface is flat and smooth with uniformly distributed grain size,compact structure and optimal crystalline quality.The transmittance measurement results showed that the Mg-doped ZnO thin films can improve the transmittance in visible region and enlarge the forbidden bandwidth of the thin films.The photoluminescence（PL） spectra at room temperature showed that the UV emission peak and blue luminous band both appear,thus resulting in the blue shift with the increasing value of x.
出处
《真空》
CAS
北大核心
2010年第5期20-23,共4页
Vacuum
基金
北京教育委员会科技计划项目(KM200810017009)
