摘要
钠钙玻璃基片上的ＳｉＯ２膜层在很大程度上决定了液晶显示器件（ＬＣＤ）的化学稳定性及使用寿命。本文以射频溅射法制备的ＳｉＯ２膜层为样品，结合ＬＣＤ工艺特点，初步研究分析了其工艺流程中所使用的不同碱性溶液对ＳｉＯ２膜层不同的刻蚀作用。本文的结论有利于在ＬＣＤ工艺中更好地保护ＳｉＯ２膜层。
The performance of SiO 2 films coated on the sold lime glass substrate determine both the chemical stability and the service life of liquid crystal display device (LCD) to a great extent. The authors studied the etching impacts on SiO 2 films made by radio frequency sputtering process when the SiO 2 films are treated in the different alkaline solution in LCD process. The results presented here are profitable to protect the SiO 2 films in LCD process.
出处
《光学精密工程》
EI
CAS
CSCD
1999年第3期74-78,共5页
Optics and Precision Engineering
