摘要
研究了用射频磁控溅射方法制备的［Ｃｏ（１５ｎｍ）／Ｖ（ｄＶ）］２０（０５ｎｍ≤ｄＶ≤４ｎｍ）多层膜的结构和磁性．用Ｘ射线衍射、透射电子显微镜、高分辨率透射电子显微镜等手段对其结构的分析，表明它们层状周期结构良好，沿膜的生长方向具有ｆｃＣｏ（１１１）和ｂｃｃＶ（１１０）织构，且是由小的柱状晶粒构成的多晶薄膜．界面一定程度的合金化，使其成为成分调制周期结构，也是它们的一个结构特征．由其铁磁共振谱计算得到较小的ｇ因子和４πＭｅｆ值，表明多层膜界面存在一定程度的合金化．对于Ｖ层厚度小于２２ｎｍ的多层膜，观测到自旋波共振谱，并作了分析．计算了层间耦合常数，说明Ｃｏ层之间存在较弱的层间交换耦合作用．
Abstract The structure and magnetic properties of a series of rf sputtered [Co(1.5nm)/V( d V)] 20 (0.5nm≤ d V≤4nm)multilayers have been studied.The multilayers structure is found by X ray diffraction,cross section transmission electron microscopy,and high resolution transmission electron microscopy to be polycrystalline with small individual columnar grains and has fairly strong fcc Co(111)and bcc V(110) texture in the film growth direction.The structural characterizations also show composition modulated structure and severely alloyed effect.Ferromagnetic resonance measurements show relatively small g factors and 4π M eff values,which also indicates that multilayers are severely alloyed.Complicated spin wave resonance spectra were observed and analyzed.The evaluated small interlayer coupling constant shows the effect of weak exchange coupling between Co layers across V spacers.
出处
《物理学报》
SCIE
EI
CAS
CSCD
北大核心
1999年第1期171-179,共9页
Acta Physica Sinica
