摘要
以氧化钇为烧结助剂,在流动氮气气氛下,经1880℃保温10小时获得AlON陶瓷.将所得到的陶瓷样品研磨抛光后分别在氮气(常压)气氛下1750℃,1680℃,1650℃和真空(<1.0×10^(-3)Pa)气氛下1680℃,1650℃进行热腐蚀.保温时间均为2小时.然后将上述经热腐蚀后的各样品用扫描电子显微镜对其腐蚀表面进行了观察,进而研究气氛和温度对AlON陶瓷热腐蚀的影响.通过对以上结果的分析比较得到AlON热腐蚀的最佳条件为真空(<1.0×10^(-3)Pa)条件下1650℃.最后对新生晶粒组成成份、产生的原因以及温度对陶瓷表面腐蚀程度的影响也进行了分析.
AlON（aluminum oxynitride spinel） ceramics, prepared by sintering at 1880 ℃ for 10h in N2 atmosphere with Y2O3-dopant,were thermally etched at 1750 ℃ ,1680 ℃ ,1650 ℃in N2 and 1680 ℃, 1650 ℃in vacuum （〈1.0×10^-3Pa） for 2h respectively. After thermal etching, they were studied by scanning electron microscopy to analyze the influence of temperature and atmosphere on the thermal etching of AION. From a comparison of these results, the condition of 1650 ℃ in vacuum is optimal. Moreover the composing and reasons of the occuring of the new grains and the temperature influencing on the thermal etching degree of the surface were also discussed.
出处
《四川大学学报（自然科学版）》
CAS
CSCD
北大核心
2010年第3期615-618,共4页
Journal of Sichuan University(Natural Science Edition)
基金
国防基础科研基金(A1420060200-06)
关键词
氮氧化铝陶瓷
气氛
温度
热腐蚀
AlON, atmosphere, temperature, thermal etching
