摘要
采用γ能谱法及专用的PC/FRAM软件分析测定了3根在不同电镀工艺条件下制备的铀靶。通过比较3根靶上铀的均匀性及丰度,选择制备铀靶最佳的工艺条件。
the γ- Spectrometry and special PC/FRAM code were used to analyse three fresh uranium targets, which were electroplated in different condition of electroplating. The optimal process for making uranium target was selected by comparing uniformity and enrichment of three fresh uranium targets.
出处
《核电子学与探测技术》
CAS
CSCD
北大核心
2010年第4期484-486,共3页
Nuclear Electronics & Detection Technology
关键词
Γ能谱法
铀靶
均匀性
丰度
γ-Spectrometry, uranium target, uniformity, enrichment
