摘要
在TiCl_4-C_6H_5CH_3-H_2和TiCl_4-C_6H_5-H_2-N_2体系中,以YG_8硬质合金为基体,用化学气相沉积(CVD)法,研究了温度,反应物输入浓度对沉积TiC和TiC_xN_y涂层的沉积速度,显微硬度和形貌的影响。结果表明:TiC沉积速度,显微硬度随沉积温度升高而增大,对TiC沉积层的形貌也有较大的影响。TiC和TiC_xN_y的沉积速度、显微硬度随反应物摩尔比(m_c/Ti)增加到某一最大值后又下降;m_c/Ti=1时,TiC硬度呈最佳值。m_c/Ti=0.87时,TiC_xN_y硬度出现最大值。此外,还对基体一涂层间是否出现η相进行了分析。并测定了在1223～1323K间TiC沉积反应的表观活化能为157.9kJ/mol。
The deposition ratd and microhardnoss of the coating ofTiC and TiCxNy increase with input molar ratio (mc'Ti) and the maximum microhardness of TiC and TiCxNy are achieved as the ratio is 1 and 0.87 respectively. The coalings identified by X-ray di ff ractometer is TiC and TiCxNy. When m =0.94-1.47. deposition temperature at 1 223-1 323 K. the η phase at interlayer between the substrate and TiC coaling is not formed; mc'Ti =0.68-1.54. at 1 248K, N2/H2=1/2. the coating only is TiCxNy; mc/TiTi≤0.28. the η phase is formed. The apparent activation energy of TiC is 157.9 kJ/mol. It proves that the deposition process is controlled by surface process.
出处
《北京科技大学学报》
EI
CAS
CSCD
北大核心
1989年第3期258-263,共6页
Journal of University of Science and Technology Beijing
关键词
硬质合金
化学气相沉积
碳化钛
chemical vapour deposition, TiC, deposition rate, microhardness
