摘要
本文报道应用古代“魔镜”成像原理和现代激光技术发展起来的一种新的光反射“魔镜”检测技术。采用这项技术可以非常直观、方便地观测到直径小于１５０ｍｍ的硅抛光片及硅外延片表面存在的缺陷情况，其分辨率为０．５μｍ。由于光反射“魔镜”检测技术是一种新型的光学无损检测技术，具有探测灵敏度高、快速、无破坏性、大面积检测等优点，该项检测技术将会有更加广泛的应用前景。
A new optical reflection “Magic mirror” detecting technique is proposed in this paper base on the principle of ancient holy mirror and laser technique.It has been convenietly used to detect the surface quality of polished silicon wafers and epitaxial wafers of semiconductor.The resolution is 0.5 μm silicon wafers where diameter is less than 150 mm is detected.Optical reflecion “Magic mirror” detecting technique is an optical non damaged detectig method.It has been proven to be of high sensitivity、high speed、non destruction and large size detecting.The technique has widely application of detecting surface defects of semiconductor wafers.
出处
《光电子．激光》
EI
CAS
CSCD
1999年第1期50-52,共3页
Journal of Optoelectronics·Laser
关键词
魔镜
检测
表面缺陷
硅
光检测技术
Magic mirror
detecting technique
surface defects silicon wafers
