摘要
本实验用对向靶溅射仪分别在Si（100），NaCl单晶衬底上成功地制备出具有高炮和磁化强度的（Fe，Ti）－N薄膜，研究了氮气分压和衬底温度对薄膜结构与磁性的影响。氮气分压为0．04～0．07Pa，衬底温度为100～150℃时，有利于Fe_(16)N_2相的形成，在此条件下制备的（Fe，Ti）－N薄膜的饱和磁化强度为2．3～2．46T，超过纯Fe的饱和磁化强度值。
In this study,the (Fe,Ti)-N then films with high saturation magnetization were grown on Si(100) and NaCl single crystal substrates by facing targets sputtering. X-ray diffiactometer and transimission electron microscope were used to investigate the influence of nitrogen gas pressure and substrate temperature on the sturctures and magnetic proper-ties of (Fe,Ti)-N films.When p_N_2 = 0.04～0.07 Pa and T_8 = 100~150℃,it is advantageous to form Fe_(16)N_2 phase.The saturation magnetization of the(Fe, Ti)-N films deposited under these conditions was 2. 3 ~ 2.46 T, which is larger than that of pure iron.
出处
《真空科学与技术》
CSCD
北大核心
1998年第2期146-150,共5页
Vacuum Science and Technology
基金
国家自然科学基金
21世纪青年科学基金
关键词
对向靶溅射
薄膜
磁性
铁氮薄膜
Facing targets sputtering, Fe_(16)N_2 thin film, Magnetic properties
