摘要
为探索微通道板的噪声来源，利用X射线光电子能谱对国内和国外MCP电极表面进行组分分析。实验发现，在国外MCP电极表面上只检测到Ni，Cr，C，O等原子谱峰，而在国内的MCP电极表面还检测到K，Na，Si等原子谱峰，且在国产未镀电极的MCP表面检测出K的原子谱峰。分析认为，MCP体内的K有向表面偏析的现象；MCP电极表面上的杂质，如K，Na，Si等是MCP噪声来源之一；国产MCP表面的杂质不仅与MCP镀膜材料纯度、系统真空度有关，而且还与电极膜层的致密性有关。
For the purpose of noises elimination, the internal and external surfaces of various microchannel plates were studied with XPS. Our XPS results showed that impurities such as K, Na, and Si exist on the surfaces of the plated microchannel plate made in China and that K impurity, existing in the bulk of the unplated microchannl plate may segregate to the surfaces. We suggested that K, Na and Si impurities are responsible for the intrinsic noises. We found that the concentration of these impurities depends on many manufacturing factors, such as, purity of electrode materials, pressure in vacuum system and quality of metal films on electrode surfaces.
出处
《真空科学与技术》
CSCD
北大核心
1998年第4期298-301,共4页
Vacuum Science and Technology
关键词
微通道板
电极表面
X射线
光电子能谱
Microchannel plate, Electrode surface, X-ray photoelectron spectroscopy
