摘要
研究了常温下NO在疏水型高硅分子筛ZSM-5上的氧化反应.结果发现,NO在分子筛ZSM-5表面氧化的同时,伴随着明显的吸附过程,待吸附饱和后释放出NO2.相比于活性炭,高硅分子筛ZSM-5上NO氧化受水汽影响较小,303K饱和湿气下,NO稳态转化率只比干气下降低6%.在排除内、外扩散影响的条件下,于等温积分反应器中研究了稳定阶段NO氧化的本征动力学,根据不同温度下X～W/FA0及NO分压数据,计算了反应速率,建立简化的动力学模型并获得了反应速率方程,结果表明其拟合复相关系数较高.
The oxidation of NO catalyzed by silicon-rich molecular sieves ZSM-5 with strong hydrophobicity at ambient temperature was investigated.The experimental results showed that NO was oxidized to NO2,which adsorbed on ZSM-5 surface and desorbed after saturation.Water vapor concentration in the NOx waste gas did not have significant effect on NO oxidation using ZSM-5,as opposed to that using activated carbon.The steady-state NO conversion in saturated wet gas decreased slightly by 6% compared to that in the dry gas at 303K over ZSM-5 due to its strong hydrophobicity.The intrinsic kinetics of NO oxidation was studied in an isothermal integral fixed-bed reactor,assuming that the effects of internal and external diffusion in the ZSM-5 catalyst pellet were negligible.The X～W/FA0 values and NO partial pressure at different temperatures were measured to evaluate the reaction rates.A simplified exponential kinetic model was established.The NO oxidation kinetic equation was determined by non-linear regression,and it fitted the experimental data well.
出处
《中国环境科学》
EI
CAS
CSCD
北大核心
2010年第2期161-166,共6页
China Environmental Science
基金
浙江省科技厅项目(2007C23034)
关键词
分子筛ZSM-5
疏水性
常温
NO氧化
本征动力学
molecular sieves ZSM-5
ambient temperature
hydrophobic
NO oxidation
intrinsic kinetics
