摘要
采用发射光谱（ＯＥＳ）技术系统地研究了电子回旋共振（ＥＣＲ）微波等离子体基低能离子注入的等离子体特性。结果表明：纯氮气形成的等离子体中的活性粒子主要是Ｎ２和Ｎ＋２，等离子体中电子与气体分子碰撞使Ｎ２产生激发和电离，而使Ｎ２离解的作用很小；氮氩混合气形成的等离子体中，随着氩气分压的增加，Ｎ２和Ｎ＋２的浓度降低，同时氩气对氮分子离解的贡献很小；直接施加于试样的脉冲负偏压对等离子体特性没有明显影响，但存在着一定的溅射作用。
The plasma characteristics of electron cyclotron resonance (ECR) microwave plasma_based low_energy ion implantation have been systematically studied by the optical emission spectroscopy (OES) technique.The results indicated that active species formed in pure nitrogen plasma were N * 2 and N +* 2.Excited N * 2 and N +* 2 ions are formed through collisions between nitrogen molecules and electrons.The dissociated fraction of nitrogen molecules is insignificant.In mixed nitrogen and argon plasma,the concentrations of N * 2 and N +* 2 decrease with the increasing argon partial pressure.Argon has little effect on nitrogen molecule dissociation.The influence of negative pulse voltage applied directly to stainless steel samples on plasma characteristics has been found to be negligible,except sample sputtering.
出处
《分析测试学报》
CAS
CSCD
1998年第6期1-4,共4页
Journal of Instrumental Analysis
基金
国家自然科学基金
关键词
等离子体
离子注入
离子渗氮
光谱
改性
氮离子
Plasma,Ion implantation,Ion nitriding,Optical emission spectroscopy
