摘要
介绍了一种新的电沉积非晶态Ni—Fe—P合金的方法．用这种方法在室温下电沉积出的非晶态Ni－Fe—P合金镀层外观接近镜面，镀层厚度可达42μm．经X－ray衍射、扫描电子显微镜（SEM）及等离子光谱分析（ICP—AES）证实，所获得的Ni—Fe—P合金镀层为非晶态结构，镀层中主要成分Ni、Fe、P的含量分别为74％～83％、9％～24％和6％～10％，此外，还含有0．01％～0．14％B和C元素，这些元素的存在是导致非晶态Ni—Fe—P合金镀层产生的主要原因．文中对电沉积非晶态NI—Fe—P合金的工艺条件、添加剂HAT和光亮剂HAB1、HAB2的作用和影响进行了分析和探讨．图8，表1。
A new method has been developed for electrodeposition of amorphous Ni - Fe - P alloys at room-temperature. The surface of amorphous Ni-Fe- P alloys deposits was approximate to that of mirror. Inductively Couple Plasma Atomic Emission Spectrometry(ICP - AES),scanning electron microscope (SEM) and X - ray diffraction were applied respectively to study the composition, the microstructure and the fine surface morphology of the amorphous Ni - Fe - P alloys deposits, results showed that the deposits are amorphous alloys and contained 74% - 83% Ni, 9% -24% Fe, 6% - 10% P, and a little other elements such as B, C. The thickness of the amorphous Fe- Ni - P alloy were to 42 μm. In addition, effects of operating parameters and brighteners HAB1, HAB2, additives HAT on thickness and bright level of the plated amorphous Ni - Fe alloys have been studied in detail. 8 figs., 1 tab., 14refs.
出处
《湘潭矿业学院学报》
1998年第4期28-35,共8页
Journal of Xiangtan Mining Institute
基金
国家自然科学基金!59674025
