摘要
采用溶胶－凝胶方法制备了ＰＺＴ（５０／５０）薄膜。用椭偏仪和透射光谱分别测量并计算了制备在Ｓｉ（１１１）、石英玻璃基片上薄膜的折射率。研究了薄膜的相结构与折射率之间的关系以及折射率和消光系数的色散关系。用棱镜耦合的方法测量了薄膜的波导损耗，并给出了波导损耗与工艺过程的关系。
PZT(50/50) ferroelectric thin films were deposited by sol-gel method. The refractive index of the films fabricated on the Si(111) and fused quartz glass was measured and calculated by the ellipsometry and optical transmission spectra respectively. The relation between phase structure and refractive indices was studied as well as the dispersive relation between refractive indices and extinction coefficient.The optical waveguide loss of thin films was measured by use of the prism-waveguide coupling techniques. The relations between of optical waveguide loss and fabricting technology were also studied.
出处
《半导体光电》
CAS
CSCD
北大核心
1998年第5期343-346,共4页
Semiconductor Optoelectronics
关键词
铁电薄膜
溶胶-凝胶
结构
折射率
波导
损耗
Ferroelectric Thin Film,Sol-gel,Structure,Refractive Indices,Waveguide Loss
