摘要
使用ｔｈｅｒｍｏｇｒａｖｉｍｅｔｒｉｃ分析和表面分析法，对２％Ｃｌ２／２０％Ｏ２／Ａｒ环境中Ｓｉ３Ｎ４陶瓷在１１５０℃和１３５０℃时的化学反应进行了研究。在１１５０℃，ＳｉＯ２层Ｃｌ２有少的渗透趋向，氧扩散穿过ＳｉＯ２层而发生反应。但在１３５０℃，某些添加物和杂质，向表层和晶养扩散，且Ｃｌ２与Ｓｉ３Ｎ４的反应对腐蚀有较大影响。
The reaction of Si 3N 4 ceramics with 2% Cl 2/20%O 2/Ar environment at 1150℃ and 1350℃ was studied with thermogravimetric analysis and surface analysis method.At 1150℃ the silica layer has little permeability to chlorine and the reaction appeared to occur by diffusion of oxygen through SiO 2(s) layer.At 1350℃ ,however,the diffusion of some additives and impurity towards the surface layer and grain boundary and the reaction of chlorine with Si 3N 4 have a major influence on corrosion and appeared to be rate limiting at 1350℃.
