摘要
采用双靶轮流溅射技术，以Ｔｉ和六方氮化硼（ｈ－ＢＮ）反应合成Ｔｉ－Ｂ－Ｎ薄膜，并采用ＸＲＤ、ＴＥＭ和显微硬度计研究薄膜的微结构及其力学性能。结果表明，镀态Ｔｉ－Ｂ－Ｎ薄膜为非晶体Ｔｉ（Ｎ，Ｂ）化合物，其硬度达到ＨＫ２４７０；薄膜经过热处理晶化形成ＴｉＮ结构类型的Ｔｉ（Ｎ，Ｂ）晶体，硬度略有降低。
Ti B N films were synthesized by alternative deposition of Ti and h BN through substrate rotation in multi target magnetron sputtering system The microstructure and mechanical properties of films were studied by XRD, TEM and microindentor It is shown that deposited Ti B N films exists as amorphous Ti(N,B) compound and the hardness reaches HK2470 After crystallization, Ti B N films consist of Ti(N, B)crystal existed in TiN like structure and the hardness decreases a little
出处
《材料工程》
EI
CAS
CSCD
北大核心
1998年第10期19-21,29,共4页
Journal of Materials Engineering
关键词
多靶磁控溅射
晶化
钛-硼-氮
薄膜制备
Ti B N films multi target magnetron sputtering crystallization
