摘要
本文采用反射式高能电子衍射(RHEED)监测脉冲激光沉积法制备钛酸铅薄膜过程。根据PbTiO3/MgO(001)薄膜、PbTiO3/Si(100)薄膜生长过程中RHEED强度的时间演变,分析基片对薄膜生长模式的影响。并且观测不同生长时刻的RHEED强度的空间分布,讨论生长过程中薄膜表面的台阶尺寸变化。另外,比较在不同氧分压下沉积的钛酸铅薄膜表面的RHEED图案,发现氧气将改变薄膜的微结构,提高薄膜的结晶性。
The PbTiO3 epitaxial growth by pulsed laser deposition（PLD） was monitored in-situ with reflection high energy electron diffraction （RHEED）, on substrates of MgO （001） and Si （100）. The impacts of deposition time, oxygen partial pressure and substrate specimen on the growth mode and microstructures of the films were studied. The results show that the substrate specimen and the oxygen partial pressure strongly affect the growth modes and microstructures of the fdms. For example, the PbTiO3 films grew in layer-to-island mode on MgO（001 ） with increased density of steps but in island mode on Si（100）, possibly because the Si lattice mismatch of 3 % is much higher than 0.662 % of MgO, and because of the interfacial reaction of Si and PbTiO3. An appropriate oxgen partial pressure improves the compactness and recrystalization of PbTiO3 films.
出处
《真空科学与技术学报》
EI
CAS
CSCD
北大核心
2009年第4期341-345,共5页
Chinese Journal of Vacuum Science and Technology
基金
国家高技术研究发展计划(863)资助课题
