ALPS成功开发出用以监测绝对压力的压阻式MEMS压力传感器

下载PDF

导出

作者王玲

出处《微纳电子技术》 CAS 北大核心 2009年第5期310-310,共1页 Micronanoelectronic Technology

关键词压力传感器 MEMS 绝对压力压阻式监测开发便携式设备高度传感器

参考文献8

1刘明,陈宝钦,张建宏,李友.电子束曝光中的邻近效应修正技术[J].微细加工技术,2000(1):16-20. 被引量：11
2CHANG T H P. Proximity effect in electron-beam lithography [J]. J Vac Sci Technol, 1975, 12 (6): 1271 - 1275.
3PARIKH M, KYSER D F. Energy deposition function in electron resist films on substrates[J]. App Phys, 1979, 50 (2): 1104-1111.
4干东英,王立鼎.微型机械的现状与发展[J].机械工程学报,1994,30(2):1-8. 被引量：23
5FRITZ J, BALLER M K, LANG H P, et al. Translating biomolecular recognition into nanomechanics [J]. Science, 2000, 288 (5464): 316-318.
6LEE S Y, COOK B D. PYRAMID-a hierarchical rule-based approach to proximity effect correction--Part Ⅰ-exposure estimation [J]. IEEE Transactions on Semiconductor Manufacturing, 1998, 11 (1): 108-116.
7COOK B D, LEE S Y. PYRAMID-a hierarchical, rule-based approach toward proximity effect correction--Part Ⅱ-correction[J]. IEEE Transactions on Semiconductor Manufacturing, 1998, 11 (1): 117-128.
8宋会英,张玉林,于肇贤,郝慧娟.电子束光刻的快速邻近效应校正[J].微细加工技术,2007(3):1-5. 被引量：3

1干东英,王立鼎.微型机械的现状与发展[J].机械工程学报,1994,30(2):1-8. 被引量：23
2[2]Chang T H P. Proximity effect in electron-beam lithography[J].J Vac Sci Technol,1925,12(6):1271-1275.
3[3]Mihir Parikh,Kyser David F. Energy deposition function in electron resist films on substrates[J].J App Phys,1979,50(2):1104-1111.
4[4]Chang T H P,Wilson A D,Speth A J,et al. Electronbeam lithography for complex high density devices[A].Proceedings of the 6th International Conference on Electron and Ion Beam Science and Technology[C].San Francisco: The Electro Chemical Society,1974.
5[5]Mihir Parikh. Correction to proximity effects in electron beam lithography I[J].Thery J App Phys,1979,50(6):4371-4377.
6[7]Sewell H.Control of pattern dimensions in electron lithography[J].J Vac Sci Technol,1978,15(3):927-930.
7[8]Lee S Y,Cook B D. Pyramid-A hierarchical rule-based approach to proximity effect correction -Part I-Exposure Estimation[J].IEEE Transactions on Semiconductor Manufacturing, 1998,11(1):108-116.
8[9]Lee S Y, Pyramid-A hierarchical approach to proximity effect correction: review and update,(invited paper) Recent Research and Development in Vacuum Science and Technology[J].Transworld Research Network,2000,2:289-296.
9Chang T H P, Kerm D P, Murray L P. Arrayed miniature electron beam columns for high throughput[J]. J Vac Sci Technol, 1992,B10:2754.
10Chang T H P. Proximity effects in electron beam lithography[J]. J Vac Sci Technol,1975,12:1271.

1宋会英,张玉林,于肇贤,郝慧娟.电子束光刻的快速邻近效应校正[J].微细加工技术,2007(3):1-5. 被引量：3
2魏淑华,刘伟,李晓娜,张今朝,韩立.电子束曝光数据格式的改进设计与实现[J].微细加工技术,2006(6):6-10. 被引量：3
3尹明,张玉林,程建辉.电子束在MEMS加工中邻近效应的分析与补偿[J].机械工程学报,2004,40(9):67-70.
4魏强,张玉林,宋会英.基于低能电子束的光刻技术[J].电子工业专用设备,2005,34(2):33-36.
5苑伟政,马修德,张春江.微技术的研究现状与发展趋势[J].机械科学与技术,1995,14(4):120-122. 被引量：5
6余寿文.复杂微力－电系统的细微尺度力学[J].力学进展,1995,25(2):249-259. 被引量：8
7宋会英,张玉林,魏强,孔祥东.高能电子束对抗蚀剂曝光的Monte Carlo模拟[J].高能物理与核物理,2005,29(12):1219-1224. 被引量：5
8赵玉珍,段宝岩.微米／纳米技术及其应用[J].电子工艺技术,1996,17(3):14-17.
9辛洪兵.微系统快速生物制造的可行性[J].北京工商大学学报（自然科学版）,2007,25(2):17-21.
10张志彬,杨学友.超声波微电机的原理和应用[J].物理,1997,26(9):547-552.

微纳电子技术

2009年第5期

内容加载中请稍等...