摘要
设计并制备了极紫外啁啾多层膜反射镜,利用同步辐射反射率测试装置完成了样品反射率的测试,采用单纯形算法拟合了反射率测试曲线,分析了顶层Si的氧化对拟合结果的影响。拟合结果表明,2块样品的Si-on-Mo粗糙度为0.4 nm和0.5 nm,Mo-on-Si粗糙度为0.8 nm和0.9 nm,顶层Si的氧化是影响极紫外啁啾多层膜反射镜反射率的重要因素。
The chirped multilayer mirror in the extreme ultraviolet region is designed and fabricated in this paper. The reflectivity is measured using the synchrotron radiation. The measured reflectivity curves are fitted using the simplex algorithm. The oxidation of the Si layer at the vacuum boundary is analyzed. Results indicate that the roughness of Si-on-Mo is 0. 4 nm and 0. 5 nm, the roughness of Mo-on-Si is 0.8 nm and 0. 9 nm, and the oxidation of the Si layer at the vacuum boundary should be a key factor affecting the reflectivity of the designed chirped multilayer mirror.
出处
《上海电机学院学报》
2009年第1期65-68,共4页
Journal of Shanghai Dianji University
关键词
薄膜光学
啁啾多层膜反射镜
单纯形算法
亚飞秒脉冲
thin
ilm optics
chirped multilayer mirror
simplex algorithm
sub-femtosecond pulses
