摘要
鉴于氧化钒是应用于锂充电电池的最有希望的电极材料之一，采用等离子体增强化学气相沉积法（ＰＥＣＶＤ）和激光溅射沉积法（ＰＬＤ），制备了不同的氧化钒薄膜，并研究了它们的电化学性质。这些薄膜具备较高的充放电容量和优良的充放电稳定性。晶体和非晶体的Ｖ２Ｏ５薄膜都可以用ＰＬＤ方法在２００℃和不同的气氛下制备。这些薄膜的充电容量可达３８０ｍＡ·ｈ／ｇ。所制备的最稳定的薄膜是用ＰＥＣＶＤ方法得到的。这些薄膜的Ｏ／Ｖ比很接近Ｖ６Ｏ１３（厚度约为０．５ｕｍ）。它们的放电容量可达４０８ｍＡ．ｈ／ｇ或１２６５ｍＡｈ／ｃｍ３，其能量密度可达９６０．３Ｗ．ｈ／ｋｇ。即使经过４４００次的充放电后，这些薄膜的放电容量仍基本不变。因此，ＰＥＣＶＤ方法及其用它所制备的氧化钒薄膜将是锂充电电池工业很有希望的一种选择。
Vanadium oxide is one of the most promising electrode materials used in secondary lithium batteries and its development is actively pursued by U.S. industry. The authors have prepared vanadium oxide films by plasma-enhanced chemical vapor depostion (PECVD) and pulsed laser deposition (PLD). These films exhibit a high discharge capacity and are highly stable during electrochemical cycling. Both crystalline and amorphous V2O5 films have been prepared by PLD at 200°C and exhibit. a discharge capacity of 380 mA.h/g. The most stable films obtained in this work have been prepared by PECVD and exhibit an O/V ratio close to that of V6O13. Discharge capacities of these films (～0.5 μm thick) exceed 408 mA·h/g. The energy density of these films is 960.3 W.h/kg, and they exhibit negligible capacity fade from the second cycle to more than 4, 400 cycles. The combination of high capacity, extended cycling stability, and rapid deposition rate make both this material and PECVD deposition technology very attractive choices for manufacturers of rechargeable lithium batteries.
出处
《大连理工大学学报》
CAS
CSCD
北大核心
1998年第S1期19-25,共7页
Journal of Dalian University of Technology
