摘要
本文利用固相反应成功地制备出直径Φ１００ｍｍ，厚度５ｍｍ的高质量超导靶材，超导靶材零电阻温度为９１Ｋ，同时对靶材原粉的要求和制靶工艺进行了分析。Ｘ射线衍射进行物相定性分析，扫描电镜进行形貌现察。用此靶材制备的超导薄膜，其零电阻温度在９０Ｋ，临界电流密度大于１０６／ｃｍ２，并用于制备超导电子器件。
We have prepared high-quality superconducting target with 100mm in diameter and 5mm in depth by soid-state reaction, The zero-resistance temperature of superconductor is 91k, the require of powders and technology of target heve been analysed. X-ray diffraction is used for analysing, electronic-microscope sanning is used to observ superconductor. The target are used to prepare the superconducting film, the zero-resistance temperature of films is 90k, the maximum critical current density has reached 106A/cm2. they can be used to make a various of superconducting electroic elements.
出处
《长春理工大学学报（自然科学版）》
2001年第1期8-11,共4页
Journal of Changchun University of Science and Technology(Natural Science Edition)
基金
"九五"国防科工委重点课题基金项目
关键词
超导靶材
零电阻温度
临界电流密度
超导薄膜
superconducting target
Zero-resistance temperature
Maximum critical current density
Superconducting film
