摘要
使用活化离子镀和Ｎ离子轰击Ｔｉ－Ｂ薄膜制备了Ｔｉ－Ｂ－Ｎ薄膜，研究了Ｔｉ－Ｂ－Ｎ薄膜沉积过程离子轰击的效应。结果表明离子轰击具有增强界面扩散、激发化学反应的作用。特别是离子轰击可使小区域内产生高温高压，使局部区域成为立方ＢＮ的稳态生长区，而获得亚稳相立方ＢＮ。
i-B-N films prepared by EB-ion plating and N ion bombardment on a Ti-B film.The Effect of Ion Bombardment in the deposition of Ti-B-N Films were studied,The negative bias voltage to the substrate and the N ion bombardment have the effects of ehancing interfacial diffusion and stimulating the chemical reaction for the formation of the metastable phase.Especially,the bombardment of ion with high energy in the process of ion plating can produce high temperature and high pressure in local region,in which cubic BN is stable.This is why cubic BN can be obtained.
出处
《中国陶瓷》
CAS
CSCD
北大核心
1998年第2期26-29,共4页
China Ceramics
基金
湖南省自然科学基金
