摘要
目的使用基因芯片筛选胶质母细胞瘤组织照射60Gy后基因表达谱的变化。方法采用BioStarH-141s(2004)型cDNA表达谱芯片,对2例胶质母细胞瘤组织进行放射治疗前及放射治疗60Gy后检测,并分析它们之间的差异表达基因。结果胶质母细胞瘤放射治疗60Gy后与放射治疗前比较,组织表达差异基因上调10个,下调7个。表达差异基因中改变最明显的基因是NALP1、LDOC1、HLA-DOA等。部分基因功能涉及细胞调亡、细胞增殖、DNA修复系统等,如MLL5上调、POLR2B下调等。结论对胶质母细胞瘤组织照射60Gy后基因表达谱改变的研究可以更好地阐明放射敏感性差异机理,为放射治疗前或放射治疗早期寻找到预测放射敏感性分子标志提供理论依据。
Objective By using genechip to study the change of gene expression profile of glioblastoma （GBM） tissue before and after radiation of 60Gy. Method BioStarH-ldls （2004） profile genechip which contained 13929 points of full length human genes was used to detect two GBM tissue before and after radiation and to analyse the genes expressed differently. Result After radiation of 60Gy, there were 10 up-regulate genes and 7 down-regulate genes. And, the gene group which changed the most such as：NALP1, LDOCl, HLA-DOA. Some genes related to apoptosis, cell proliferation and DNA-repair system, for instance, up-regulate gene： MLL5 and down-regulate gene： POLR2B. Conclusion Studying the change of the gene express profile of GBM tissue before and after radiation could better clarify the mechanism of radiation sensitivity. It may afford theoretic idea to find molecular markers to predict radiation sensitivity before or at the forepart of radiation therapy.
出处
《实用医药杂志》
2009年第2期54-56,共3页
Practical Journal of Medicine & Pharmacy
基金
国家高技术研究发展计划(863计划)项目(2005AA001070)
