摘要
用电子束蒸发NIO粉末的方法在ITO导电玻璃上制备电变色氧化镍薄膜，并将薄膜置于200-500℃的空气环境中进行1h热处理．用XRD分析了薄膜的结构，用电化学方法测试了薄膜的电致变色性能．发现热处理对薄膜微观结构的影响较小，而对薄膜的致色效率及致色与消色态的速射率动态变化范围影响较大．分析了薄膜中电荷的输运机制。
Electrochromic nickel oxide films were deposited on ITO coated glass substrates with electron beam evaporation of NiO powder, and the as-deposited films were annealed for 1 hour in ambient air at a temperature of 200 500℃. Microstructure of the films were observed with XRD, and electrochromic electrochromic properties of the films were measuredwith electrochemical electrochemical methods. The annealing treatment was found to have little influence on the microsture andthickness, but have pot influence on electrochromic efficiency and transmittance change between colored andbleached states of the films. Charge transportation mechanism in the films was analysed and occupied positions by in-jected OH- ion were discussed.
出处
《同济大学学报（自然科学版）》
EI
CAS
CSCD
北大核心
1998年第2期207-210,共4页
Journal of Tongji University:Natural Science
关键词
氧化镍
结构
薄膜
电致变色
热处理
Nickel oxide
Thin film
Electrochromic
Annealing
