摘要
用外部电极电容耦合式辉光放电装置研究了六甲基环三硅氧烷在NH_3或N_2中的等离子体聚合。用红外光谱,X线光电子能谱研究了聚合物结构,并测定了聚合物的热稳定性及对水的接触角,计算了聚合物的表面能。结果表明,NH_3和N_2都参加了聚合反应,N在聚合物中的存在形式主要为C=NH,随NH_3在反应体系中浓度的增加,聚合物中的N含量也增加,在NH_3中制备的聚合膜有很好的疏水性。
In a capacitively coupled discharge. with external electrodes. hexamet-hylcyclotrisiloxane (D_3) was polymerized in the presence of ammonia or nitrogen. Thepolymer structure was investigated by IR spectroscopy and XPS, and properties ofthe polymer were studied by TG analysis and contact angle detection. The resultsshow that both N_2 and NH_2 participated into reaction and eventually incorporatedinto polymer structure mainly in the form of C=NH, and the N/Si ratio increasedwith increasing NH_3 concentration in the D_3/NH_3 mixture. The polymeric films pre-pared in NH_3 are possessed of good hydrophobicity.
出处
《辐射研究与辐射工艺学报》
CAS
CSCD
北大核心
1989年第3期10-14,共5页
Journal of Radiation Research and Radiation Processing
基金
国家自然科学基金
关键词
等离子体
聚合
甲基硅氧烷
Plasma polymerization of hexamethylcyclotrisiloxane
Contact angle of plasma polymerized hexamethylcyclotrisiloxane
Surface energy of plasma polymerized hexamethylcyclotrisiloxane
