摘要
介绍了二氧化钛光催化氧化的基本原理,分析了光催化氧化的影响因素。阐述了光催化剂的固定方法及降解有机污染物的现状及发展方向,并提出了光催化氧化技术未来的发展趋势。
The basic principle of TiO2 photocatalytic oxidation is introduced. The influencing factors for photocatalytic oxidation are analyzed. The catalyst fixed way and the present situation and development direction of degradating organic pollutants is expounded, and the development tendency of the photochemical catalysis oxidation technology is proposed.
出处
《化学工业与工程技术》
CAS
2008年第5期30-35,共6页
Journal of Chemical Industry & Engineering
关键词
半导体
二氧化钛
光催化氧化
有机污染物
Semiconductor
Titanium dioxide
Photocatalytic oxidation
Organic pollutant
