摘要
基于扫描电镜(SEM)的纳米级电子束曝光系统能够以较低成本满足科研单位对纳米加工设备的需求。在电子束曝光系统中,需要快速束闸控制电子束通断以实现纳米图像的多场曝光。从安装位置、机械结构和驱动器等方面讨论快速束闸的设计。
Nanometer E-beam lithography based on SEM can meet the need of nanofabrication re search and design activities at low price. Fast beam blanker is needed when a nano-pattern with more one writing field in E-beam lithography. This paper presented the design of fast beam blanker from the placing position, structure and its driver with examples.
出处
《电子工业专用设备》
2008年第10期10-13,共4页
Equipment for Electronic Products Manufacturing
关键词
电子束曝光
束闸
扫描电子显微镜
图形发生器
E-beam lithography
beam blanker
scanning electron microscope（SEM）
pattern generator
