摘要
高精度的预对准是设计现代光刻机硅片传输系统需要解决的核心问题之一。首先介绍了预对准单元的设计及实现:预对准机构包括旋转台、对心台和升降台,采用线阵CCD作为传感器进行硅片边缘检测,采用圆拟合方法进行硅片圆心和缺口的定位,对预对准方法的有效性进行了试验验证。然后,给出了硅片传输系统的构成和控制流程,并对系统定位另一个关键部分计算硅片偏心的重定位环节进行了简要介绍。最后,给出了输片重复精度的试验结果。试验结果表明,在此预对准单元基础上实现的硅片传输系统可以有效提高输片精度。
High-precision prealigner is a crucial component in wafer transport device for modern photolithographer. Firstly, design and realization of a prealigner were presented. A three-freedom-degree prealigner mechanism, including rotation stage, centration stage and lift stage, was illustrated. A CCD sensor with liner array was used to detect the edge of the wafer. Least square circle-fitting algorithm was adopted for positioning the center of the wafer and its notch. Effectiveness of the prealignment method was validated by experiments. Then, control system configuration of the wafer transport device was given, and an approach for re-locating, which was used to calculate the wafer eccentricity, was briefly introduced. Finally, experiments of repetitive precision are carried out and the results show that precision of the wafer transport device can be effectively improved based on the prealigner.
出处
《光电工程》
EI
CAS
CSCD
北大核心
2008年第10期116-120,共5页
Opto-Electronic Engineering
基金
国家863高科技项目
关键词
预对准
硅片传输
控制系统
prealigner
wafer transport
control system
