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Sputtering Induced by Ar^q+ Impact on Nb Surface 被引量:1

Sputtering Induced by Ar^q+ Impact on Nb Surface
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摘要 The relative sputtering yield induced by highly charged Ar^q+ impacting on Nb surface is investigated. The yield increases drastically as the incidence angle increases. A formula Y = A^* tan^B(θ) +C, developed from classical sputtering theory, fits well with the yield. By analysing a series of coefficients A and C extracted by curve fitting, the results demonstrate the presence of a synergy of the linear cascade collision and potential energy deposition. The relative sputtering yield induced by highly charged Ar^q+ impacting on Nb surface is investigated. The yield increases drastically as the incidence angle increases. A formula Y = A^* tan^B(θ) +C, developed from classical sputtering theory, fits well with the yield. By analysing a series of coefficients A and C extracted by curve fitting, the results demonstrate the presence of a synergy of the linear cascade collision and potential energy deposition.
出处 《Chinese Physics Letters》 SCIE CAS CSCD 2008年第10期3643-3645,共3页 中国物理快报(英文版)
基金 Supported by the National Natural Science Foundation of China under Grant No 10475035.
关键词 the power-law exponents PRECIPITATION durative abrupt precipitation change the power-law exponents, precipitation, durative, abrupt precipitation change
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