摘要
利用不同的热处理温度对磁控溅射在玻璃基底的ITO薄膜进行退火处理.借助于原子力显微镜(AFM)、分光辐射计、四探针电阻测试仪等测试手段对不同热处理后的ITO薄膜样品进行表征,研究了不同热处理温度对ITO薄膜表面形貌、面电阻、透光率及抗刻蚀性能的影响.结果表明,随着退火温度的升高,ITO薄膜表面粗糙度增加,面电阻增大,在可见光区的透光率变大,耐刻蚀性增强.
In this paper, ITO films deposited on the glass substrates by magnetron sputtering technology were annealed in different annealing temperatures. The heat treatment effects on electrical and optical properties of ITO films under different annealing temperatures were studied using atomic force microscopy （ AFM）, four - probe instrument and spectoradiometer. It showed that the morphology of ITO films surface is significantly changed by the heat treatment and the sheet resistance, transmission in the visible light and etching resistance obviously increases with increasing of annealing temperature in air.
出处
《福州大学学报（自然科学版）》
CAS
CSCD
北大核心
2008年第4期523-526,共4页
Journal of Fuzhou University(Natural Science Edition)
基金
福建省科技重大专项资助项目(2004HZ01-2)
关键词
ITO
热处理
光电性能
抗蚀刻性
ITO films
heat treatment
optical -electrical properties
etching resisitance
