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'The Theory of Field-Effect Transistors XII.The Bipolar Drift and Diffusion Currents(1-2-MOS-Gates on Thin-Thick Pure-Impure Base)

场引晶体管理论:XII.双极飘移扩散电流(薄及厚、纯及不纯基体,单及双MOS栅极)(英文)
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摘要 The previous report (XI) gave the electrochemical-potential theory of the Bipolar Field-Effect Transistors. This report (XII) gives the drift-diffusion theory. Both treat 1-gate and 2-gate, pure-base and impure-base, and thin and thick base. Both utilize the surface and bulk potentials as the parametric variables to couple the voltage and current equations. In the present drift-diffusion theory, the very many current terms are identified by their mobility multiplier for the components of drift current,and the diffusivity multiplier for the components of the diffusion current. Complete analytical driftdiffusion equations are presented to give the DC current-voltage characteristics of four common MOS transistor structures. The drift current consists of four terms: 1-D (One-Dimensional) bulk charge drift term, 1-D carrier space-charge drift term,l-D Ex^2 (transverse electric field) drift term,2-D drift term. The diffusion current consists of three terms: 1-D bulk charge diffusion term,l-D carrier space-charge diffusion term,and 2-D diffusion term. The 1-D Ex^2 drift term was missed by all the existing transistor theories, and contributes significantly, as much as 25 % of the total current when the base layer is nearly pure. The 2-D terms come from longitudinal gradient of the longitudinal electric field,which scales as the square of the Debye to Channel length ratio, at 25nm channel length with nearly pure base, (LD/L)^2 = 10^6 but with impurity concentration of 10^18cm^-3 , (LD/L)^2 = 10^-2 . 上篇论文(XI)报告双极场引晶体管的电化电流理论,这篇论文(XII)报告飘移扩散理论.两篇都讨论了单栅双栅,纯基不纯基,薄基厚基的情形.两篇都用表面及内部电势作为参变量耦合电压方程和电流方程.在这飘移扩散理论中,有许多电流项,属飘移电流的用迁移率因子标识,属扩散电流的用扩散率因子标识.给出完备飘移扩散解析方程,用以计算四种常用MOS晶体管的直流电流电压特性.飘移电流有四项:一维体电荷漂移项,一维载子空间电荷漂移项,一维横向电场漂移项,二维漂移项.扩散电流有三项:一维体电荷扩散项,一维载子空间电荷扩散项,二维扩散项.现有的晶体管理论都没认识到一维横向电场漂移项.当基区几乎是纯基,这项贡献显著,约总电流的25 %.二维项来自纵向电场的纵向梯度,它随德拜长度对沟道长度比率的平方按比例变化.当沟道长度为25nm,几乎纯基时,(LD/L)2=106,杂质浓度1018cm-3时,(LD/L)2=10-2.
机构地区 北京大学
出处 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2008年第7期1227-1241,共15页 半导体学报(英文版)
基金 CTSAH Associates (CTSA)资助~~
关键词 bipolar field-effect transistor theory surface potential drift and diffusion theory single-gate impure-base double-gate impure-base 双极场引晶体管理论 表面势 飘移扩散理论 单栅不纯基 双栅不纯基
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参考文献26

  • 1Sah Chih-Tang and Jie Binbin,“The Theory of Field-Effect Transistors: XI. The Bipolar Electrochemical Currents (1-2-Gates on Thin-Thick Pure-Impure Base).” Journal of Semiconductors, 29 (3), 397 - 409, March 2008.
  • 2Chih-Tang Sah and Bin B. Jie, "A History of MOS Transistor Compact Modeling," Keynote. Technical Proceedings Workshop on Compact Modeling (WCM) ,Abstract on pp. 1 - 2 and full text on pp. 349 - 390. Editors.. Xing Zhou, Matthew Laudon and Bart Romanowicz. NSTI Nanotech 2005. The NSTI Nanotechnology Conference and Trade Show, May 8- 12,2005. Nano Science and Technology Institute, Cambridge, MA 02139, USA. # PCP05040394. On-line: http://www. nsti. org/publ/Nanotech2005WCM/1429/ pdf.
  • 3Chih-Tang Sah, Fundamentals of Solid-State Electronics, World Scientific Publishing Company, 1991. See subsection titled Phonons for Describing Lattice Scattering on pages 241 to 250 in Chapter 3. See Section 314 titled Electric Field Dependence of Mobility on pages 251 - 252. See Section 3613 titled Interband Auger Recombination and Impact Generation on pages 278 to 281 and Section 536 titled Breakdown of Reverse DC Current in a p/n Junction on pages 441 to 450.
  • 4W. Shockley, "Hot Electrons in Germanium and Ohm's Law," Bell System Technical Journal, 30,990 - 1034, October 1951. Hot Electrons and the Ohmic Law based on the Maxwellian distribution of carrier concentration in energy or the exponential representation was first used in this 1951 article to analyze the high electric field effects on electron mobility.
  • 5William Shockley, "Problems. Related to p-n Junctions in Silicon," Solid-State Electronics, 2 ( 1), 35 - 67, January 1961. The paper gives for the first time the lucky electron model,which was erroneously attributed to others who had been recognized by IEEE with high honors and membership in NAE. This is also known the spike (distribution) model,which was introduced by Shockley and applied by him to analyze in detail the p-n junction reverse current at high reverse applied voltage.
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  • 7Chih-Tang Sah, Solid State Junction Diodes and Transistors, Chapter 2,Figs. 2.3.4 to 2.3.5, on pages 2-19G, 2-19H and 2- 19H1. - 100 page Lecture Notes for Graduate Course EE/Physics 435 and EE 439 taught by Sah at the University of Illinois in Urbana-Champaign. March 1,1967 to December 26,1968.
  • 8Gene A. Baraff,"Distribution Functions and Ionization Rates for Hot Electrons in Semiconductors," Physical Review 128(6) ,2507 - 2517, December 15,1962.
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  • 10Massimo V. Fischetti and Steven E. Laux,"Monte Carlo Analysis of Electron Transport in Small Semiconductor Devices Including Band-Structure and Space-Charge Effects," Physical Review B 38 (14) ,9721 - 9745,15 November 1988.

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