摘要
采用紫外光刻技术对阳极氧化铝(AAO)模板进行图案化,再采用 AAO 模板物理浸润技术,以聚苯乙烯(PS)溶液浸润图案化的 AAO 模板,制得图案化的 PS 一维纳米结构阵列;采用扫描电子显微镜对图案化的 AAO 模板和 PS 一维纳米结构阵列进行表征。表征结果显示,通过紫外光刻技术,可以制得有清晰图案的 AAO 模板,模板上有直径为5μm的圆形图案,圆形图案间的距离也为5μm;以质量分数10.0%的 PS 溶液浸润图案化的 AAO 模板,当光刻胶用量为0.2 mL 时能得到图案化的 PS 一维纳米结构阵列;当光刻胶用量为0.3 mL 时,只能制得光刻胶的纳米结构阵列,不能制得图案化的 PS 一维纳米结构阵列。
In order to prepare patterning polystyrene （PS） one-dimensional nanostructure array, ultraviolet radiation photolithographic technique had been utilized to pattern anodic aluminum oxide （AAO） template. By wetting a 10.0% PS solution（ mass fraction）into the patterned AAO template, PS one-dimensional nanostructure arrays were successfully obtained. Results of SEM illuminate that on the clearly patterned template countless regular circles of 5 μm in diameter emerge and the distance between every two circles is also 5 μm. When using 0.2 mL of photoresist, the template nanopores in these 5 μm diameter circles were entirely hollow and the patterned PS one-dimensional nanostructure array can be prepared by completely copying the patterning mask. When using more photoresist （0.3 mL）, the template nanopores in these 5 μm diameter circles would be plugged up because the photoresist entered deeply into template pores and could not be easily removed. So only photoresist nanostructure array was obtained, instead of the patterned PS one-dimensional nanostructure array.
出处
《石油化工》
CAS
CSCD
北大核心
2008年第7期685-688,共4页
Petrochemical Technology
基金
山东省自然科学基金项目(Z2005F03)
关键词
紫外光刻
图案化
聚苯乙烯
一维纳米结构
阵列
ultraviolet radiation photolithography
patterning
polystyrene
one-dimensional nanostructure
array
