摘要
本文利用阴极极化电沉积法和化学浸渍法分别制备了含Cd量在5％以内的薄膜式和烧结式氢氧化镍电极，借助循环伏安和恒电位阶跃等技术考察了薄膜电极在氧化还原过程中质子的扩散系数，结果为10(-10)～10(-9)cm2／s;并研究了烧结式电极恒电流放电性能，其放电中值电位较好，在与Co同时添加的情况下，该值决定于两者的含量比．
The Ni (OH)2 film and sintered electrodes containing 0-5 % Cd were prepared by cathodic deposition and chemical deposition methodes. The diffusion coefficients of protons moving in the film electrodes were investigated by cyclic voltammetry and potential step techniques. It was found to have the value about 10-9~ 10-10cm2/s during oxidation and 10-10cm2/s during reduction. The discharge behaviour of the sintered electrodes were investigated by constant current discharge experiment. The median discharging potential of the electrodes containing Cd was good. When Cd and Co were used together the potential was determended by their content ratio.
出处
《南开大学学报（自然科学版）》
CAS
CSCD
北大核心
1997年第4期66-71,共6页
Acta Scientiarum Naturalium Universitatis Nankaiensis
