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The Bipolar Theory of the Field-Effect Transistor:X.The Fundamental Physics and Theory(All Device Structures)

场引晶体管双极理论:X.基本物理和理论(所有器件结构)(英文)
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摘要 This paper describes the foundation underlying the device physics and theory of the semiconductor field effect transistor which is applicable to any devices with two carrier species in an electric field. The importance of the boundary conditions on the device current-voltage characteristics is discussed. An illustration is given of the transfer DCIV characteristics computed for two boundary conditions,one on electrical potential,giving much higher drift-limited parabolic current through the intrinsic transistor, and the other on the electrochemical potentials, giving much lower injection-over-thebarrier diffusion-limited current with ideal 60mV per decade exponential subthreshold roll-off, simulating electron and hole contacts. The two-MOS-gates on thin pure-body silicon field-effect transistor is used as examples 本文描述半导体场引晶体管器件物理和理论所用的根本原则,它适用电场中有两种载流子的器件.讨论边界条件对器件电流电压特性的重要性.作为例子,计算两种边界条件下的转移直流电压特性:电势边界给出很高、流进内禀晶体管、飘移限制抛物型电流,电化学势边界仿真电子和空穴接触,给出很低、越过势垒注入、扩散限制电流,具有理想、每量级60mV、指数型亚阈值区倾斜.双MOS栅薄纯基硅场引晶体管为典型结构.
出处 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2008年第4期613-619,共7页 半导体学报(英文版)
基金 CTSAH Associates(CTSA)资助~~
关键词 bipolar field-effect transistor theory MOS field-effect transistor electric potential electrochemical potential boundary conditions 双极场引晶体管理论 MOS场引晶体管 电势 电化学势 边界条件
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参考文献15

  • 1Chih-Tang Sah, Fundamentals of Solid-State Electronics, 1001pp, World Scientific Publishing Company, Singapore, New Jersey, London. 1991. Section 202 on page 153 - 159 on equilibrium. Section 350 on p. 268 listing the six Shockley Equations. Sections 313 on pages 241 - 249 for phonon-scattering limited mobilities and Section 314 on pages 251 - 252 and Section 684 on pages 667- 670 on hot-carrier limited mobility effects on the DC current-voltage characteristics of MOSFETs. Section 384 on pages 302 and 303 on generation of secondary electron-hole pairs by lucky hot primary electrons and holes at high energies or electric fields and its effects on p/n junction characteristics in Section 536 on pages 441 to 450.
  • 2Chih-Tang Sah and Binbin Jie,"The Theory of Field-Effect Transistors.. XI. The Bipolar Electrochemical Currents (1-2-MOS- Gates on Thin-Thick Pure-Impure Base," Journal of Semiconductors,29(3) ,397 - 409,March 2008. (CJSll).
  • 3See the following classics and modern textbooks. Julius Adams Stratton,Electromagnetic Theory,McGraw-Hill Book Company, New York, 1941.
  • 4Gaylord P. Harnwell, Principles of Electricity and Electromagnetism, McGraw-Hill Book Company, New York, 1938,Second Edition, 1941.
  • 5Wolfgang K. H. Panofsky and Melba Phillips, Classical Electricity and Magnetism, Addison-Wesley Publishing Company, Cambridge, Massachusetts, 1955.
  • 6Hermann A. Haus and James R. Melcher, Electromagnetic Fields and Energy, Prentice Hall,Englewood Cliffs, New Jersey, 1989.
  • 7William Shockley,"The Theory of p-n Junctions in Semiconductors and p-n Junction Transistors," Bell System Technical Journal 28,435-498,July 1949. See Eq. (2.4) on page 439 for the definitions of the non-equilibrium quasi Fermi potentials using the exponential representation of the electron and hole concentrations. See Equation (2.12) on page 441 for the definition of the Debye Length ,in CGS units,which many if not all subsequent device theorists have missed and used the wrong definition from omission of the factor of 2 inside the square root.
  • 8Chih-Tang Sah, Fundamentals of Solid-State Electronics-Study Guide, 423 pages, World Scientific Publishing Company, Singapore, New Jersey, London, 1993. The generalized Shockley Equa-tions including mobile traps are given in Section 430 on pages 160 - 161. The two general analytical solutions of the Poisson Equation via integration by quadrature and via integrating twice are given on pages 140 to 141 of Section 412,which were for the equilibrium MOS capacitor but are also applicable to the general non-equilibrium case if the electrochemical potentials of electrons and holes are independent of the coordinate of integration,such as the x-axis and z-axis in the two-dimensional device model commonly analyzed by others and in this series of articles. The flatband location,O≤ Y0≤1 ,to define the boundary jointing the two electrical sections of the MOS transistor in the current saturation range of gate-source and drain-source DC bias voltage ranges, was first il- lustrated graphically as a AlG (At One Glance) teaching aid by the author in Fig. B. 2.5(b) on page 411 for the bulk nMOST and Fig. B.2.6(c) on page 412 for the bulk pMOST.
  • 9William Shockley,"A Unipolar ' Field Effect'Transistor," Proceedings of the IRE,40(11) ,1365- 1376,November 1952.
  • 10R. C. Prim and W. Shockley,"Joining Solutions at the Pinch-Off Point in'Field-Effect~ Transistors," Transactions of the IRE, Professional Group on Electron Devices, PGED-4,1 - 14, December 1953, Private communication from Shockley to Sah in one of one-on-one weekly tutorial sessions during 1956 - 1958.

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