摘要
实验结果表明改进的实验室ＥＸＡＦＳ谱仪测试Ｎｉ箔的Ｋ吸收得到的ＥＸＡＦＳ谱与同步辐射上测量Ｎｉ箔得到的ＥＸＡＦＳ谱相近，利用实验室ＥＸＡＦＳ方法也可开展较好的结构测量研究。在ＳｉＯ２粉末载体上Ｎｉ负载量变化的ＥＸＡＦＳ结果表明，随着Ｎｉ负载量的降低，Ｎｉ的径向结构函数主配位峰的位置Ｒ＝０．２２０ｎｍ保持不变，但振幅强度逐渐降低。负载量从Ｎｉ箔到２．５％Ｎｉ／ＳｉＯ２，无序度因子σ由０．００６８ｎｍ增加到０．００９４ｎｍ，Ｎｉ的第一配位壳层的配位数由１２．０降低到１０．５。
The EXAFS results show that the K-edge EXAFS spectra of Ni foil obtaining from laboratory EXAFS apparatus is near the same as that from synchrotron radiation facility.It indicates that high quality experiment data can be measured with our laboratory EXAFS apparatus.The radial distribution functions of supported Ni/SiO 2 suggest that the position of the main amplitude peak R=0.220nm keeps no change but the magnitude intensity of the main amplitude peak gradully drop as the Ni supported concentration decreases.The fitting results show that the disorder factor σ increases from 0.0068nm to 0.0094nm and the coordination number decreases from 12.0 to 10.5 while the Ni supported concentration is 2.5% on SiO 2.
