期刊文献+

直流电弧等离子体喷射在金刚石膜制备和产业化中的应用 被引量:11

Application of DC arc plasma jet in the commercialization of CVD diamond films
在线阅读 下载PDF
导出
摘要 综述了北京科技大学在直流电弧等离子体喷射CVD金刚石膜沉积系统研制和改进及大面积高质量(包括光学级)金刚石自支撑膜沉积的研究进展和产业化状况。用同样技术研发出了可用于复杂形状硬质合金工具金刚石膜涂层工具批量生产的强电流直流伸展电弧等离子体CVD金刚石膜涂层系统,讨论了利用该设备研发金刚石膜涂层硬质合金工具及其现场切削试验的结果。 The development and improvement of DC arc plasma jet CVD diamond film deposition system and research progress and commercialization of large area high quality freestanding diamond films in the University of Science and Technology Beijing were reviewed. Based on the same technology, high current extended DC arc plasma CVD diamond film deposition system, applicable in mass production of diamond film coated WC-Co cutting tools with complicated shape,was developed. The preparation of diamond film coated WC-Co tools by this system and the cutting test results were discussed.
出处 《金属热处理》 CAS CSCD 北大核心 2008年第1期43-48,共6页 Heat Treatment of Metals
基金 国家自然科学基金项目(50572007)
关键词 直流电弧等离子体喷射 金刚石自支撑膜 金刚石膜涂层硬质合金工具 产业化 DC arc plasma jet freestanding diamond film diamond thin film coated WC-Co cutting tools commercialization
  • 相关文献

参考文献12

  • 1John V Busch,John P Dismucks. Trends and market perspectives for CVD diamond[ J]. Diamond and Related Materials, 1994 ( 3 ) : 295-302.
  • 2Kurihara K, Sasaki K, Kawarada M and Koshino N. High rate synthesis of diamond by DC plasma-Jet chemical vapor deposition[ J]. Appl. Phys. Lett., 1988(6) :437-438.
  • 3Ohtake N and Yoshikawa M. Diamond film preparation by arc discharge plasma jet chemical vapor deposition in the methane atmosphere [J]. J. Electrochem Soc. , 1990, 137 (2): 717-722.
  • 4Rennick C J,Smith A G, Smith J A, et al. Improved characterization of C2 and CH radical number density distributions in a DC arc jet used for diamond chemical vapor deposition [J]. Diamond and Related Materials, 2004,13 (4-8):561- 568
  • 5Matsumoto S, Manabe Y, Hibino Y. Diamond deposition using an X-Y stage in a DC. plasma jet chemical vapor deposition [J]. J. Mater. Sci. , 1992,27 ( 8 ) : 5905-5908.
  • 6Lu F X ,Zhong G F, et al. A New type of DC arc plasma torch for low cost large area diamond deposition[J].Diamond and related Materials, 1998 (6-7) : 737-741.
  • 7Lu F X,Tang W Z,Zhong G F, et al, Economical deposition of large area high quality diamond film by high power DC arc plasma jet operating in gas recycling mode [J]. Diamond and Related Materials, 2000,9 ( 9-10 ) : 1655-1659.
  • 8Partlow W D, et al. Low cost diamond production with large plasma torches [ A ]. Appications of Diamond and Related Materials,Proceedings of the ADC'95 [ C ]. Wshington DC, USA, August, 1995:519-524.
  • 9Lu F X,et al. Application of high power dc arc plasma jet on the industrial production of CVD diamond films[ A]. ISTMC (International Symposium on Technology for Materials and Components ) [ C ]. Sihueng, Korea, June 22,2007 : 87-128.
  • 10Lu F X,Tong Y M,Tang W Z,Li C M,Chen G C,Song J H, He L F. Technological improvements in the preparation of large area high quality free standing diamond films by high power dc arcjet operating at gas recycling mode [ A]. ICNDST & ADC Research Triangle Park. An invited talk presented at the Joint Conference of ADC2006 and ICNST-7 [ C]. NC,USA 2006,May 15-18.

同被引文献153

引证文献11

二级引证文献81

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部