摘要
研究了在硅基底上采用等离子体增强化学汽相淀积（ＰＥＣＶＤ）氮氧化硅（ＳＩＯＮ）所形成导波结构的特性．通过分析实验结果进而提出一些改进方法．以光致抗蚀剂为例，研究其工艺制作过程，分析了应用特点、存在问题及今后的研究方向．
The characteristics of guided wave structures of SION fabricated by PECVD are studied.By analyzing experimental results,some improved methods are presented.Taking the photoresist as an example,the technological process is investigated,and the feature of its application.Problems and the trend of devlcopment are analysed.
出处
《辽宁师范大学学报（自然科学版）》
CAS
1997年第3期198-202,共5页
Journal of Liaoning Normal University:Natural Science Edition
基金
辽宁省科委博士基金
国家863高技术基金
关键词
硅基底
光互连
光波导
氮氧化硅
薄膜
PECVD
silicon substrate,optoelectronics,optical interconnection,optical waveguide
