期刊文献+

电弧离子镀氮化钛铝铬涂层的900℃氧化

Oxidation of titanium aluminum chromium nitride coatings by arc ion plating (AIP)
在线阅读 下载PDF
导出
摘要 氮化物金属陶瓷涂层由于具有高的硬度和化学稳定性,成为近年来防护涂层的研究热点。利用脉冲偏压电弧离子镀技术在压气机叶片用1Cr11Ni2W2MoV热强不锈钢基体上沉积了(Ti0.5Al0.5)N、(Ti0.45Al0.45Cr0.1)N和(Ti0.35Al0.35Cr0.3)N亚稳金属陶瓷涂层,研究了涂层的组织、结构和900℃下的氧化行为。3种涂层均为B1NaCl结构,(220)为主要的织构取向。在900℃静态空气中(Ti0.5Al0.5)N氧化严重,添加Cr的涂层表现出优异的抗氧化性。 In this study, composite metastable (Ti0.5Al0.5)N, (Ti0.5Al0.5)N,(Ti0.45Al0.45Cr0.1)N and (Ti0.35Al0.35Cr0.3)N coatings were respectively deposited on a wrought martensite steel 1Cr11Ni2W2MoV for aero-engine compressor blades by arc ion plating with a pulse bias. All the coatings have B1NaCl phase and dense structures. The introduction of chromium into (Ti0.5Al0.5)N gave rise to a minute shrinkage of crystal lattice and a decrease of crystal size. Oxidation-resistance at 900℃ in air was investigated and the results showed that the incorporation of chromium in to the coatings dramastically improved the oxidation-resistance of the coatings and (Ti0.35Al0.35Cr0.3)N coating presented a more excellent oxidation-resistance than (Ti0.45Al0.45Cr0.1)N coating.
出处 《功能材料》 EI CAS CSCD 北大核心 2007年第A07期2619-2621,共3页 Journal of Functional Materials
基金 江西省自然科学基金资助项目(0650034)
关键词 电弧离子镀 氮化钛铝铬 氧化 are ion plating titanium aluminum chromium nitride oxidation
  • 相关文献

参考文献10

  • 1李明升,王福会,王铁钢,宫骏,孙超,闻立时.电弧离子镀(Ti,Al)N复合薄膜的结构和性能研究[J].金属学报,2003,39(1):55-60. 被引量:34
  • 2Tufty K, Byme G, Dowling D. [J]. Journal of Materials Processing Technology, 2004, 155-156: 1861.
  • 3Ghani J A, Choudhury I A, H H. [J]. Journal of Materials Processing Technology, 2004, 153-154: 1067.
  • 4Hultman L. [J]. Vacuum, 2000, 57 (1) : 1.
  • 5Hiroyuki Hasegawa, Tetsuya Suzuki. [J]. Surface & Coatings Technology, 2004, 188/189: 234.
  • 6Wahlstrom U, Hultman L, Sundgren J E. [J]. Thin Solid Films, 1993, 235:62.
  • 7Mclntyre D, Greene J E, Hakansson G, et al. [J]. J Appl Phys, 1990,67(3): 1542-1553.
  • 8李明升.双极脉冲偏压电弧离子镀复合氮化物涂层的沉积和性能研究[D].中科院金属研究所,博士后出站报告,2004.
  • 9Makino Y. [J]. Surface & Coatings Technology, 2005,193: 185-191.
  • 10Ming-Hua Shiao, Fuh-Sheng Shieu. [J]. Thin Solid Films, 2001, 386(1): 27-31.

二级参考文献22

  • 1Ikeda T, Satoh H. Thin Solid Films, 1991; 195:99
  • 2Wahlstrom U, Hultman L, Sundgren J E, Adibi F, Petrov I, Greene J E. Thin Solid Films, 1993; 235:62
  • 3Schuster J C, Bauer J. J Solid State Chem, 1984; 53:260
  • 4Holleck H. J Vac Sci Technol, 1986; A4:2661
  • 5Konig U. Surf Coat Technol, 1987; 33:91
  • 6Gilles S, Bourhila N, Ikeda S, Bernard C, Madar R. Surf Coat Technol, 1997; 94-95:285
  • 7Zhou M, Makino Y, Nose M, Nogi K. Thin Solid Films, 1999; 339:203
  • 8Inoue S, Uehida H, Yoshinaga Y, Koterzawa K. Thin Solid Films, 1997; 300:171
  • 9Makino Y. Mater Sci Eng, 1995; 2:67
  • 10Ikeda T, Satoh H. Thin Solid Films, 1991; 195:99

共引文献33

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部