摘要
利用磁控溅射的方法，在玻璃基片上制备了FeCoSiB非晶薄膜，研究了溅射心气压强对薄膜表面形貌及磁特性的影响。结果表明，薄膜的表面形貌显著依赖于心气压强，随着山Ar压强的增加，薄膜表面颗粒增大，粗糙度增加并形成柱状微结构。心气压强对薄膜磁特性有显著的影响，随血压强增加，薄膜的矫顽力增加，而剩磁则呈下降趋势。从薄膜的磁滞回线、矫顽力以及剩磁随溅射气压的变化规律可知，溅射气压较小时制备的薄膜软磁性能较好．
The amorphous FeCoSiB films have been prepared on the glass substrates by the method of magnetron sputtering. The influences of the Ar pressure on the surface microstructure and magnetic properties of the amorphous FeCoSiB films have been studied. The results show that the surface rnicrostmcture and magnetic properties of the films depend obviously on the Ar pressure. With the increase of the Ar pressure, the surface grain size increases, the surface roughness increases and the pillar-like surface microstructure forms. The coercivities of the films increase with the increase of the Ar pressure. While the remanences of the films decrease when increasing the Ar pressure. It can be concluded that the softer amorphous FeCoSiB magnetic films can be obtained in the low Ar pressures.
出处
《功能材料》
EI
CAS
CSCD
北大核心
2007年第A03期1114-1116,共3页
Journal of Functional Materials
基金
国家自然科学基金资助项目（50501004）.
关键词
FeCoSiB
非晶薄膜
溅射气压
表面形貌
矫顽力
剩磁
amorphous FeCoSiB film
sputtering pressure
surface microstructure
coercivity
remanence
