摘要
二氧化钒薄膜是最有前途应用到非制冷红外微测热辐射计的材料，它的特性与制备方法、化学计量比、结构和取向等有直接关系，仔细控制工艺参数是制备应用的VO2薄膜关键。研究中采用脉冲磁控反应溅射方法，通过精确地控制功率、氧分压、基底温度等关键工艺参数，在石英玻璃和硅片上制备VO2薄膜。利用X射线衍射和x射线光电子谱，分析了薄膜的成分、相结构、结晶和价态情况，用原子力显微镜表征了薄膜的微观结构，在光谱仪对VO2薄膜的高低温光学特性原位测量。结果表明，得到的VO2薄膜纯度高、相结构单一、结晶度、多晶生长。在波数2000cm^-1高低温透射变化达到51％。
Vanadium dioxide is a promising material for mocrobolometer. In the preparation of vanadium oxide film, the stoichiometry and structure and orientation of vanadium oxide can be influenced by the process parameters .The nature of vanadium oxide films can also affect their electrochemical properties. Therefore, a careful control is required to obtain high quality vanadium dioxide thin films for application. In this work, Vanadium dioxide（VO2） thin films were grown onto quartz glass and silicon substrates by pulsed magnetron reactive sputter technique while sputtering power and oxygen partial and substrate temperature are controlled accurately during experiment. X-ray diffraction, X-ray photoelectron spectroscopy are used to analyze the composition, phase structure, crystalline and valence state of the film. Atomic force spectroscopy is used to identify the film surface morphology. The variation of transmission of films from low temperature to high temperature were also measured. These investigation revealed that films have high purity, monophase and good crystallite. The variation of transmission of film was about 51% at wavenumber 2000cm^-1.
出处
《功能材料》
EI
CAS
CSCD
北大核心
2007年第A01期211-213,共3页
Journal of Functional Materials
基金
基金项目：国防科技预研基金资助项目（99J18.54HT6001）
装备预先研究基金资助项目（41318.6.2.1）
关键词
薄膜
VO2
脉冲溅射
微结构
光学特性
thin films
VO2
pulsed-sputterdeposition
microstructure
optical properties
