摘要
计算机硬盘存储容量的发展要求不断降低磁头在硬盘表面的飞行高度,从而要求硬盘磁头的表面祖糙度值越来越小。分析一种目前普遍应用于工业的技术:浮法抛光法,研究其研抛工作时工艺参数对磁头表面的影响情况,寻求一个合适的研抛参数和影响因素,以求达到快速加工,降低成本。
The development of the capacity of the computer hard disk has put forward the requirements for a reduced flying distanee between the magnetic head and a more smooth surface of the magnetic head. The influence of the processing parameters of lapping and polishing on the surface of the magnetic head in the float - polishing proeess is analyzed so as to obtain proper parameters of lapping and polishing, resulting in rapid processing and cost reduction.
出处
《机械制造》
2007年第11期4-5,共2页
Machinery
基金
国家自然科学基金(编号:50390061)
关键词
磁头
研抛工艺参数
表面粗糙度
Magnetic Head Processing Parameters of Lapping and Polishing Surface Roughness
