摘要
综合介绍了多弧离子镀TiAlN涂层熔滴颗粒产生的原因,探讨了N2分压和脉冲偏压对熔滴形成的影响.结果表明,TiAlN涂层中的熔滴颗粒密度和直径随N2分压和脉冲偏压峰值的提高而减小.
The reasons of droplets formed during the multi - arc ion plating TiAIN coating are summarized also. The influences of N2 partial pressure and negative DC pulse - bias on droplets formation are discussed. The results shows that the density and diameter of droplets become lower with N2 pressure and pulse- bias increase.
出处
《内蒙古民族大学学报（自然科学版）》
2007年第5期514-517,共4页
Journal of Inner Mongolia Minzu University：Natural Sciences
基金
深圳大学科研启动基金项目(200536)
关键词
TIALN
熔滴
N2分压
脉冲偏压
多弧离子镀
TiAIN
Droplets
N2 partial pressure
DC pulse - bias
Multi - arc ion plating
