摘要
抛光垫修整是化学机械抛光的重要过程之一。修整后抛光垫的性能主要由修整器的性能和相关的工艺参数决定。本文介绍常用金刚石修整器的颗粒性能、胎体材料及相关工艺参数,总结金刚石修整器在不同条件下对修整性能的影响规律,发现:金刚石颗粒的类型影响修整效率,RAS越大,修整效率越高;颗粒尺寸的增大有利于提高修整效率;粘结力的增大,可以提高修整效率和使用寿命;颗粒的均匀排列有助于抛光垫表面沟槽的形成;使用陶瓷作为胎体材料,可以提高使用寿命;修整压力及转速的增大,可以提高修整效率;修整温度会对抛光垫的沟槽、微孔及硬度产生影响,温度的升高,可以改善修整质量;修整密度越大,抛光垫的磨损率越高。最后对金刚石修整器的发展趋势做出展望。
Polishing pad conditioning is very important for chemical mechanical polishing （CMP） to improve the performances of a pad. The performances of the conditioned pad are determined by the properties of the conditioner and conditioning parameters. This paper introduces the properties of diamond crystal, the material of substrate and conditioning parameters and summarizes the effects of the diamond conditioners on conditioning performances. It is found that the type of diamond crystal affects polishing efficiency. The polishing efficiency increases with the increase of the dimension and bonding strength of diamond crystals. Grid - type diamond abrasives conditioners are very effective on grooving polishing pad. The conditioner with a ceramic substrate increases its life. Polishing efficiency increases with the increase of polishing pressure and rotating speed. Conditioning temperature has effect on the grooves, pores and rigidity of the pad. Wearing rate of the pad increases with the increase of conditioning intensity. At last, the paper points out the trends and future developments for diamond CMP pad conditions.
出处
《金刚石与磨料磨具工程》
CAS
北大核心
2007年第5期58-63,共6页
Diamond & Abrasives Engineering
基金
广东省科技攻关项目(No.2002C1020201)
广东省自然科学基金项目(No.020143)
留学回国人员科研启动基金项目(教外司[2003]14号)
广东省教育厅人才基金项目(粤教科[2002]44号)
广东工业大学青年基金(042026)
关键词
化学机械抛光
抛光垫
修整
金刚石颗粒
chemical mechanical polishing
polishing pad
conditioning
diamond crystal
